EMFFLUO

    Activates a detailed treatment of photoelectric interactions and of
    the following atomic deexcitation, with production of fluorescence
    X-rays (and a rough treatment of Auger electrons)

    See also EMF

    This option, meaningful only if the EMF option has been requested
    (explicitly or implicitly via option DEFAULTS), requires a special
    unformatted file, pre-connected as logical input unit 13 (see Chap. 3}).
    This file is delivered with the FLUKA code.

     
WHAT(1)
 > 0 : set fluorescence on
             < 0 : set fluorescence off
             = 0 : ignored
               
Default
 = -1.0 (no fluorescence) if option DEFAULTS is not used, 
                       or if it is used with anything but CALORIMEtry, DAMAGE,
                       EM-CASCAde, HADROTHErapy, ICARUS or PRECISIOn.
                       If DEFAULTS is used with a 
SDUM
 value equal to one of the
                       latter, the default is 1.0 (fluorescence on).

     
WHAT(2)
 = lower bound (or corresponding name) of the material indices in
               which fluorescence is activated
               ("From material 
WHAT(2)
...")
               
Default
 = 3.

     
WHAT(3)
 = upper bound (or corresponding name) of the material indices in
               which fluorescence is activated
               ("... to material 
WHAT(3)
...")
               
Default
  = 
WHAT(2)

     
WHAT(4)
 = step length in assigning indices
               ("...in steps of 
WHAT(4)
")
               
Default
 = 1.

     
WHAT(5)
, 
WHAT(6)
, 
SDUM
 : not used

     
Default
 (option EMFFLUO not requested): fluorescence is not simulated
               unless option DEFAULTS is chosen with 
SDUM
 = CALORIMEtry,
               DAMAGE, EM-CASCAde, HADROTHErapy, ICARUS or PRECISIOn.

     
Notes:
         1) Selection of EMFFLUO option is only meaningful for a material
            defined with electron and photon cutoffs lower than the highest
            K-edge in the elements constituents of that material.

         2) When EMFFLUO is activated for a compound material, if the incident
            photon energy is lower than the highest K-edge for any constituent
            element, FLUKA uses separate parameterised representations of the
            photoelectric cross section between different edges of each
            constituent element (all levels are tabulated).
            If the photon energy is higher than the highest K-edge, average
            cross sections for the compound are used, but FLUKA still samples a
            single element on which to interact, in order to generate the
            correct fluorescence photon or Auger electron.

     Example (number-based):

 *...+....1....+....2....+....3....+....4....+....5....+....6....+....7...
 EMF
 EMFCUT         1.E-5     1.E-5       0.0       17.       18.
 EMFFLUO          1.0       17.       18.
 *   In the above example, the user activates fluorescence production in
 *   Lead and Tantalum (standard FLUKA material numbers 17 and 18). The
 *   photon and electron cutoff has been set at 10 keV (the K-edge for
 *   Pb and Ta is of the order of 100 keV).

     The same example, name-based:

 EMF
 EMFCUT         1.E-5     1.E-5       0.0      LEAD  TANTALUM
 EMFFLUO          1.0      LEAD  TANTALUM

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